HOANG, Ngoc Lam Huong.
Electrical Properties of Nb-Doped TiO2 Thin Films Deposited by Co-sputtering Process.
VNU Journal of Science: Mathematics - Physics, [S.l.], v. 33, n. 3, sep. 2017.
ISSN 2588-1124.
Available at: <https://js.vnu.edu.vn/MaP/article/view/4091>. Date accessed: 23 dec. 2024.
doi: https://doi.org/10.25073/2588-1124/vnumap.4091.