HOANG, Ngoc Lam Huong.
 Electrical Properties of Nb-Doped TiO2 Thin Films Deposited by Co-sputtering Process.
<strong>VNU Journal of Science: Mathematics - Physics</strong>, [S.l.], v. 33, n. 3, sep. 2017.
ISSN 2588-1124.
Available at: &lt;<a href="https://js.vnu.edu.vn/MaP/article/view/4091" target="_new">https://js.vnu.edu.vn/MaP/article/view/4091</a>&gt;. Date accessed: 22 nov. 2024.
doi: <a href="https://doi.org/10.25073/2588-1124/vnumap.4091">https://doi.org/10.25073/2588-1124/vnumap.4091</a>.