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Phase Tailoring of Dense Tantalum Films for Improving Hardness of Titanium Implants Using Negative Substrate Bias During DC Sputtering at Low Temperature.
VNU Journal of Science: Mathematics - Physics, [S.l.], v. 41, n. 1, mar. 2025.
ISSN 2588-1124.
Available at: <https://js.vnu.edu.vn/MaP/article/view/4958>. Date accessed: 04 apr. 2025.
doi: https://doi.org/10.25073/2588-1124/vnumap.4958.